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Varian 3290 Sputtering System

Equipment: Varian 3290 Sputtering System
Manufacturer: Varian
Description:

 Sets the pace for state-of-the-art wafer sputtering. The system is based upon the widely accepted and field-proven design of the acclaimed 3280. It provides significant improvements for even greater performance and reliability.


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Varian 3190 Metal Sputtering System, 5"

Equipment: Varian 3190 Metal Sputtering System, 5"
Manufacturer: Varian
Description:

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NRC / Varian 3125 E-Beam Evaporator

Equipment: NRC / Varian 3125 E-Beam Evaporator
Manufacturer: Varian
Description:

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NRC / Varian 3117 Thermal Evaporator

Equipment: NRC / Varian 3117 Thermal Evaporator
Manufacturer: Varian
Description:

Diffusion pump with liquid nitrogen trap and mechanical pump Large Bell Jar with implosion guard and electrically actuated hoist No crystal monitor and no ion gauge meter.


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Varian 3180 Sputtering System

Equipment: Varian 3180 Sputtering System
Manufacturer: Varian
Description:

Magnetron sputtering system configured for 4" wafers, System is fully automated, cassette-to-cassette, and has high throughput, Equipped with 3 targets and an RF-sputter etch module for in-situ substrate cleaning prior to sputtering, as-is.

 


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