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Karl Suss MA150 Mask Aligner

Equipment: Karl Suss MA150 Mask Aligner
Manufacturer: Suss MicroTec /  Karl Suss
Description:

The Karl Suss MA150 production aligner platform offers a higher overlay accuracy, more flexible wafer handling including reject and buffer cassette option and SECS II/GEM functionality.


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Karl Suss MA6 Mask Aligner / Exposure System

Equipment: Karl Suss MA6 Mask Aligner / Exposure System
Manufacturer: Suss MicroTec /  Karl Suss
Description:

The Karl Suss MA6 is one of the most reliable mask aligners in the industry with low maintenance cost. It works with substrate up to 150mm in diameter.


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Karl Suss MA6 / BA6 with Backside Alignment (BSA)

Equipment: Karl Suss MA6 / BA6 with Backside Alignment (BSA)
Manufacturer: Suss MicroTec /  Karl Suss
Description:

The Karl Suss MA6 / BA6 is exclusively intended for use as an alignment and/or exposure device for substrates used in Semiconductor and Microsystems Technology.


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Karl Suss MA56 Mask Aligner Exposure System

Equipment: Karl Suss MA56 Mask Aligner Exposure System
Manufacturer: Suss MicroTec /  Karl Suss
Description:

The Karl Suss MA 56 is a mask alignment and exposure system that has highly ecnomonical production capabilities for wafers up to 125mm. It's easy to maintain and can be easily adapted to fit your particular process requirements.


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Karl Suss MA8

Equipment: Karl Suss MA8
Manufacturer: Suss MicroTec /  Karl Suss
Description:

The SUSS MA8 is the system solution for lithography in R & D on substrate sizes up to 200 mm. Widely employed in development and pilot production of IC backend processes, the MA8 also provides full laboratory mask aligner versatility and flexibility. The compatibility of the exposure modes allows processes to be developed on the MA8 which can then be run in production on any of the SUSS MA200 production mask aligners.


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Karl Suss MA200CC Mask Aligner Exposure System

Equipment: Karl Suss MA200CC Mask Aligner Exposure System
Manufacturer: Suss MicroTec /  Karl Suss
Description:

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Karl Suss MJB3 Aligner Exposure System

Equipment: Karl Suss MJB3 Aligner Exposure System
Manufacturer: Suss MicroTec /  Karl Suss
Description:

 The MJB-3s are suitable for handling wafers up to 3 inches in diameter and can be used for other samples.


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Karl Suss MJB-55

Equipment: Karl Suss MJB-55
Manufacturer: Suss MicroTec /  Karl Suss
Description:

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KLA-Tencor RS-75 Resistivity Mapping System

Equipment: KLA-Tencor RS-75 Resistivity Mapping System
Manufacturer: Suss MicroTec /  Karl Suss
Description:

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