Need Help?
Inventory Banner
Home > Lithography - Photoresist - Exposure Systems

Lithography - Photoresist - Exposure Systems

Canon MPA 500 Projection Mask Aligner

Equipment: Canon MPA 500 Projection Mask Aligner
Manufacturer: Canon
Description:
View Details >>

Canon MPA 600FA Mirror Projection Aligner

Equipment: Canon MPA 600FA Mirror Projection Aligner
Manufacturer: Canon
Description: This mirror projection aligner has a single auto-feeder. It is cassette to cassette and also has backside wafer handling.
View Details >>

Canon PLA 501F Parallel Light Mask Aligner

Equipment: Canon PLA 501F Parallel Light Mask Aligner
Manufacturer: Canon
Description:
View Details >>

Fusion 200 PCU Photostabilization System

Equipment: Fusion 200 PCU Photostabilization System
Manufacturer: Fusion
Description: A photostabilizer with a fully automated, stand-alone, system for unicassette processes. Allows wafer sizes: 100mm to 200mm.
View Details >>

Karl Suss MA150 Mask Aligner

Equipment: Karl Suss MA150 Mask Aligner
Manufacturer: Suss MicroTec / Karl Suss Equipment
Description: The Karl Suss MA150 production aligner platform offers a higher overlay accuracy, more flexible wafer handling including reject and buffer cassette option and SECS II/GEM functionality.
View Details >>

Karl Suss MA6 Mask Aligner / Exposure System

Equipment: Karl Suss MA6 Mask Aligner / Exposure System
Manufacturer: Suss MicroTec / Karl Suss Equipment
Description: The Karl Suss MA6 is one of the most reliable mask aligners in the industry with low maintenance cost. It works with substrate up to 150mm in diameter.
View Details >>

Karl Suss MA6 / BA6 with Backside Alignment (BSA)

Equipment: Karl Suss MA6 / BA6 with Backside Alignment (BSA)
Manufacturer: Suss MicroTec / Karl Suss Equipment
Description: The Karl Suss MA6 / BA6 is exclusively intended for use as an alignment and/or exposure device for substrates used in Semiconductor and Microsystems Technology.
View Details >>

Karl Suss MA56 Mask Aligner Exposure System

Equipment: Karl Suss MA56 Mask Aligner Exposure System
Manufacturer: Suss MicroTec / Karl Suss Equipment
Description: The Karl Suss MA 56 is a mask alignment and exposure system that has highly ecnomonical production capabilities for wafers up to 125mm. It's easy to maintain and can be easily adapted to fit your particular process requirements.
View Details >>

EVG 620 Automated Mask Alignment System

Equipment: EVG 620 Automated Mask Alignment System
Manufacturer: EVG
Description:  Known for its high level of automation and reliability, the EVG620 is a dual-use tool designed for optical double-side lithography and precision alignment up to 150 mm wafer sizes. Volume production types and manual R&D systems are available. An ultra-soft wedge compensation together with a computer controlled contact force between the mask and wafer ensures that both yield and mask lifetime are dramatically increased while production costs are lowered. The fully-automated EVG620 utilizes a cassette-to-cassette handling system to efficiently process wafers from 50 mm to 150 mm in diameter, regardless of their shape or thickness. The system safely handles thick, bowed or small diameter wafers. The EVG620 superior alignment stage design achieves highly accurate alignment and exposure results while maintaining high throughput.
View Details >>

EVG 610 Semi-automated Mask Alignment System

Equipment: EVG 610 Semi-automated Mask Alignment System
Manufacturer: EVG
Description:  The EVG®610 is a highly flexible R&D system that can handle small substrate pieces and wafers up to 200 mm. The tool supports a variety of standard lithography processes, such as vacuum-, soft-, hard- and proximity exposure mode, as well as other specific applications, including bond alignment, nano imprint lithography (NIL) and micro contact printing. The system offers quick re-tooling with a conversion time of less than one minute, making it ideal for universities, R&D and small-volume production applications.
View Details >>

KLA-Tencor Alpha Step 500 Profilometer

Equipment: KLA-Tencor Alpha Step 500 Profilometer
Manufacturer: KLA-Tencor / ADE , KLA-Tencor , KLA-Tencor Equipment
Description:
View Details >>

Karl Suss MA8

Equipment: Karl Suss MA8
Manufacturer: Suss MicroTec /  Karl Suss , Suss MicroTec / Karl Suss Equipment
Description: The SUSS MA8 is the system solution for lithography in R & D on substrate sizes up to 200 mm. Widely employed in development and pilot production of IC backend processes, the MA8 also provides full laboratory mask aligner versatility and flexibility. The compatibility of the exposure modes allows processes to be developed on the MA8 which can then be run in production on any of the SUSS MA200 production mask aligners.
View Details >>

Karl Suss MA200CC Mask Aligner Exposure System

Equipment: Karl Suss MA200CC Mask Aligner Exposure System
Manufacturer: Suss MicroTec /  Karl Suss , Suss MicroTec / Karl Suss Equipment
Description:
View Details >>

Karl Suss MJB3 Aligner Exposure System

Equipment: Karl Suss MJB3 Aligner Exposure System
Manufacturer: Suss MicroTec /  Karl Suss , Suss MicroTec / Karl Suss Equipment
Description:  The MJB-3s are suitable for handling wafers up to 3 inches in diameter and can be used for other samples.
View Details >>

Karl Suss MJB-55

Equipment: Karl Suss MJB-55
Manufacturer: Suss MicroTec /  Karl Suss , Suss MicroTec / Karl Suss Equipment
Description:
View Details >>

OAI 5000 Mask Aligner Exposure System

Equipment: OAI 5000 Mask Aligner Exposure System
Manufacturer: OAI
Description: The system can process a wide range of materials including glass and ceramic ranging in substrate size from 5mm to 200mm.
View Details >>

OAI 500 Mask Aligner Exposure System

Equipment: OAI 500 Mask Aligner Exposure System
Manufacturer: OAI
Description:  Designed for maximum versatility, the OAI Model 500 high-resolution mask alignment and exposure system is a high-performance contact mask aligner developed for ultra-precise, submicron, level-to-level alignment lithography.
View Details >>

Fusion 150 PC Photostabilization System

Equipment: Fusion 150 PC Photostabilization System
Manufacturer: Fusion
Description: A photostabilization system with 4" to 6" wafer capability. It's a cost-effective, one-step solution for photoresist stabilization of 75-150mm wafer substrates.
View Details >>

© 2017 SPEC Equipment. All Rights Reserved.