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Asher - Etch - Descum Equipment

GaSonics AE2001 Etch System

Equipment: GaSonics AE2001 Etch System
Manufacturer: GaSonics , GaSonics Legacy
Description: Microwave downstream etcher. 
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Branson IPC L2101

Equipment: Branson IPC L2101
Manufacturer: Branson IPC
Description: Branson/IPC Mod. S2100-11220 Reactor Center
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Branson IPC L3200

Equipment: Branson IPC L3200
Manufacturer: Branson IPC
Description: Dual quartz chambers for 100-150mm wafers, cassette to cassette operation.
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GaSonics 7104

Equipment: GaSonics 7104
Manufacturer: Branson IPC , GaSonics , GaSonics Legacy
Description: The 7100 Series is the most popular of the GaSonics International industrial batch treatment and cleaning systems. This full-featured system is based on proven reactor features and system drivers developed over the past twenty years. The GaSonics tool is a batch plasma system. Processing is accomplished at low temperature, and is used for surface treatment, descum, and cleaning organic material such as photoresist from metal, silicon, and other assemblies.
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GaSonics AE-2000LL Isotropic Etcher

Equipment: GaSonics AE-2000LL Isotropic Etcher
Manufacturer: GaSonics , GaSonics Legacy
Description: The GaSonics Aura Loadlock Isotropic Etcher (AE-2000LL) is a microprocessor-controlled down-stream etcher that etches the font, and optionally, the backside of a wafer. The AE-200LL uses a dual-pumping loadlocked system with a heated split-pattern design, wafer transport arms and wafer storage elevators. The AE-2000LL can be used with wafers of 5-8 inch with only minor hardware modifications.
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GaSonics Aura 3010 Photoresist Asher

Equipment: GaSonics Aura 3010 Photoresist Asher
Manufacturer: GaSonics
Description: A downstream photoresist removal system. A damage-free asher with closed loop temperature control. 5 - 8 inch (125mm-200mm) wafer capability.
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GaSonics Aura 3010 Photoresist Asher with SMIF

Equipment: GaSonics Aura 3010 Photoresist Asher with SMIF
Manufacturer: GaSonics , GaSonics Legacy
Description: A downstream photoresist removal system. A damage-free asher with closed loop temperature control. 5 - 8 inch (125mm-200mm) wafer capability. This tool comes with optional integrated SMIF by Asyst.
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GaSonics L3500

Equipment: GaSonics L3500
Manufacturer: GaSonics , GaSonics Legacy
Description: The GaSonics/IPC L3500 asher is a versatile system, designed for clean, damage-free removal of the most difficult resist structures. Using the production proven L3300 platform, the L3500 improves throughput and has a wide process window die to its patented large diameter microwave plasma source.
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GaSonics Aura 2000LL Photoresist Asher

Equipment: GaSonics Aura 2000LL Photoresist Asher
Manufacturer: GaSonics , GaSonics Legacy
Description: The GaSonics Aura 2000-LL Asher is a single wafer load locked system, designed to address the demands for ultra clean, damage free photoresist removal.
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GaSonics PEP 3510A/A Dual Chamber

Equipment: GaSonics PEP 3510A/A Dual Chamber
Manufacturer: GaSonics , PEP 3510
Description: The GaSonics PEP 3510A is a versatile microwave downstream photoresist removal system, designed for clean, damage-free removal of photoresist. PEP 3510A utilizes a combination of platen and lamp wafer heating resulting in excellent removal rates and uniformity. This system excels in bulk photoresist removal, and descum applications.
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GaSonics PEP Iridia

Equipment: GaSonics PEP Iridia
Manufacturer: GaSonics , PEP Iridia
Description: The GaSonics PEP Iridia is a dual chamber etcher used to independently deskin (remove a crusted layer of photoresist without penetrating a lower layer of conventional photoresist) or to independently remove photoresist. 
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Tegal 903E Plasma Etch System

Equipment: Tegal 903E Plasma Etch System
Manufacturer: Tegal
Description: Cassette to cassette single wafer plasma etcher system.  
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March PX-1000 Batch RIE Asher/Etcher System

Equipment: March PX-1000 Batch RIE Asher/Etcher System
Manufacturer: March
Description:  Downstream RIE or isotropic plasma barrel asher/etcher system.
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Matrix 105 Asher System

Equipment: Matrix 105 Asher System
Manufacturer: Matrix
Description:  Model 105 low temperature asher.
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GaSonics IPC Series 9104 Plasma Asher

Equipment: GaSonics IPC Series 9104 Plasma Asher
Manufacturer: GaSonics , GaSonics Legacy
Description: The GaSonics 9104 is a plasma asher from the GaSonics IPC series.
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GaSonics L3510E Isotropic Etch System

Equipment: GaSonics L3510E Isotropic Etch System
Manufacturer: GaSonics , GaSonics 3510EPC / GaSonics L3510E
Description: The GaSonics L3510E is a high etch rate, downstream isotropic etching system, designed to provide isotropic profiles along with the ability to etch or ash at low temperatures. Utilizing the proven L-Series 3510 platform, the etch system also uses the downstream microwave sources and applicator. With excellent process controls, the 3510E provides a wide range of process capabilities and applications. The system also includes a topside lamp option for heating the substrates in a “pins up” mode. The “pins up” mode allows backside etching of various materials.
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Anatech 600 Series Model SP150 Quartz Barrel Plasma Asher / Desum

Equipment: Anatech 600 Series Model SP150 Quartz Barrel Plasma Asher / Desum
Manufacturer: Anatech
Description: Anatech 600 Series Model SP150 Quartz Barrel Plasma Asher / Desum
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Branson IPC 4000 Barrel Asher

Equipment: Branson IPC 4000 Barrel Asher
Manufacturer: Branson IPC
Description:
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NEW SP 3510PC

Equipment: NEW SP 3510PC
Manufacturer: SPEC , GaSonics , SPEC 3510PC / GaSonics L3510
Description: SPEC Equipment has developed a new and improved PC-based 3510 system. This new system replaces the legacy GaSonics L3510. The SP 3510PC is a custom downstream photoresist removal system that utilizes time-tested process hardware components while replacing legacy control items and other obsolete devices and hardware. With numerous modernizations such as newly-designed contemporary control system, a full-color Graphic User Interface, real-time graphing, saved data recall, this system is unparalleled in the industry.  
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GaSonics L3510 Single Wafer Ashing System

Equipment: GaSonics L3510 Single Wafer Ashing System
Manufacturer: SPEC , GaSonics , SPEC 3510PC / GaSonics L3510
Description: The GaSonics L3510 is a versatile downstream photoresist removal system, designed for clean, damage-free removal of the most difficult resist structures. Utilizing the production-proven L-Series platform, the L3510 has a wide process window due to its patented microwave plasma source. Programmable heating and process controls contribute to the system's unparalleled process flexibility.
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SPEC 3510E PC Isotropic Etch System

Equipment: SPEC 3510E PC Isotropic Etch System
Manufacturer: GaSonics , GaSonics 3510EPC / GaSonics L3510E
Description: SPEC Equipment has developed the new GaSonics L3510E PC isotropic etching system. Designed for high etch rates, the 3510 PC provides isotropic profiles along with the ability to etch or ash at low temperatures. The new PC interface utilizes the proven L-Series 3510 process hardware, while replacing the legacy electronics and components. These new modernizations include a newly designed contemporary control system; color Graphic User Interface, real time graphing and saved data recall. With excellent process controls and proven downstream microwave source, the 3510E PC provides a wide range of process capabilities and applications. The system also includes a topside lamp option for heating the substrates in a “pins up” mode. The “pins up” mode allows backside etching of various materials.   
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SPEC 3510E PC Isotropic Etch System

Equipment: SPEC 3510E PC Isotropic Etch System
Manufacturer: GaSonics , GaSonics 3510EPC / GaSonics L3510E
Description: SPEC Equipment has developed the new GaSonics L3510E PC isotropic etching system. Designed for high etch rates, the 3510 PC provides isotropic profiles along with the ability to etch or ash at low temperatures. The new PC interface utilizes the proven L-Series 3510 process hardware, while replacing the legacy electronics and components. These new modernizations include a newly designed contemporary control system; color Graphic User Interface, real time graphing and saved data recall. With excellent process controls and proven downstream microwave source, the 3510E PC provides a wide range of process capabilities and applications. The system also includes a topside lamp option for heating the substrates in a “pins up” mode. The “pins up” mode allows backside etching of various materials.  
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SPEC Aura 1000PC

Equipment: SPEC Aura 1000PC
Manufacturer: SPEC Aura 1000PC / GaSonics Aura 1000
Description:  
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GaSonics Aura 1000

Equipment: GaSonics Aura 1000
Manufacturer: SPEC Aura 1000PC / GaSonics Aura 1000
Description: The GaSonics Aura 1000 single-wafer photoresist asher is an automated tool designed as a flexible downstream plasma photoresist removal system for high-volume wafer fabrication. GaSonics offers the Aura in direct response to manufacturers' concern about wafer sensitivity to processing damage, reliability, and low cost of ownership. 
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