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AG Associates 8108 Heatpulse

Description:

Rapid thermal processor system with the processing capability of up to 8"


Features:
  • Standard end effectors
  • 2 cassette station swivel
  • Cooling station
  • Wafer aligner
  • Robot with controller
  • Temperature control
  • DCP Pyrometer ATP #1 and #2
  • 6-gas panel
  • Precise temperature / time control
  • Multiple cycle processing
Specifications:
  • Single wafer processing capability up to 8"
  • Steady state temperature range 400° to 1200°C
  • Steady state process time programmable: 0-600 sec
  • Ramp-up rate programmable: 10 - 25 c/sec
  • Full SECS II capability
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