Equipment: OAI 5000 Mask Aligner Exposure System
Manufacturer: OAI
Description:

The system can process a wide range of materials including glass and ceramic ranging in substrate size from 5mm to 200mm.

Equipment: OAI 500 Mask Aligner Exposure System
Manufacturer: OAI
Description:

 Designed for maximum versatility, the OAI Model 500 high-resolution mask alignment and exposure system is a high-performance contact mask aligner developed for ultra-precise, submicron, level-to-level alignment lithography.