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showing 1 - 25 of 175
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AAF Air Flow Hepa Filters
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AAF Air Flow Hepa Filters - 2 Motorized - 6 Regular
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Inquire
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ADE 6034 Microsense
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ADE 6034 -Microsense
Measures: Wafer thickness total, Thickness variation (TTV), Flatness, bow and warp.
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Inquire
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ADE 8100 Microscan
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ADE MicroScan 8100 Wafer Inspection / Sorter System
Measures Wafer Thickness, Bow, Warp, Site Flatness and Global Flatness
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Inquire
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ADE Ultra Gage 9500
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Multifunction Dimensional measurements for 500 nm Design Rule. Supports 4" to 8" wafer diameter.
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Inquire
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ADE Ultrascan 9300 Wafer Inspection / Sorter System
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Non-Contact Capacitive Probe Measurement with 10nm Resolution, 400 to 1000 Microns Wafer Thickness Range. Capable of handling 100mm to 200mm Wafers.
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Inquire
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ADE Ultrascan 9350 Wafer Inspection System
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Non-Contact Capacitive Probe Measurement with 10nm Resolution, 400 to 1000 Microns Wafer Thickness Range. Capable of handling 100mm to 200mm Wafers.
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Inquire
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Affinity Chiller with Thronton 200R Controller
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Affinity EWA-23DK-HE06CBNO Chiller with Thronton 200R Controller
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Inquire
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AG Associates 4100 Heatpulse
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Rapid Thermal Processor System Capability up to 6"
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Inquire
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AG Associates 610 Heatpulse
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Rapid Thermal Processor PC Control Capability of 2" to 6" Wafers.
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Inquire
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AG Associates 8108 Heatpulse
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Rapid Thermal Processor System, Single Wafer Processing Capability up to 8".
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Inquire
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AG Associates Heatpulse 410
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Rapid Thermal Processor, PC Control Capability of 2" to 5" Wafers.
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Inquire
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Alcatel BF ADP30 Vacuum pump with cart & control unit
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Alcatel BF ADP30 Vacuum pump with cart & control unit
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Inquire
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Alpha Step 200 Profiler System - KLA - Tencor
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System used for step heights, etch depths, coating thickness, micro roughness and a variety of precision surface characteristics
Capability to handle 3" to 8" wafer
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Inquire
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Anatech Hummer VI Sputtering System
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Hummer VI Sputtering System, Built-in L/H D1.6B Roughing Pump. 4" Dia. chamber x 4" high.
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Inquire
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ASQ Technology Wafer Transfer Unit - 8-Inch
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ASQ Technology Wafer Transfer Unit - 8-Inch
Model : AT2S8 - (2 available)
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Inquire
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Blue M DCC 146C
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14X14x11 (3 inch spacer in oven) would be 14 Inside Chamber , 46Hx 30Wx 26 ½ L
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Inquire
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Blue M Model DCC-146C
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Cleanroom Oven
Chamber size : 14" H x 10.5" W x 14" D
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Inquire
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Blue M Oven DC-146C
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14x14x14 Inside oven chamber 42Hx30Wx22 ½L outside chamber
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Inquire
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Branson IPC 4000 Barrel Asher
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Barrel Asher
Chamber size: 10" W x 23"D Capability up to 8".
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Inquire
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Branson IPC L2101
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Branson/IPC Mod. S2100-11220 Reactor Center, w/1ea 12"(dia) x 20"(D) quartz chamber.
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Inquire
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Branson IPC L3200
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Dual quartz chambers for 100-150mm wafers, cassette to cassette operation.
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Inquire
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Canon MPA 500 Projection Mask Aligner
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Auto Feeder: Single, cassette to cassette, backside wafer handling Wafer size: currently 5" (4" and 3" sizes available)
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Inquire
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Canon PLA 501F Parallel Light Mask Aligner
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Parallel Light Mask Aligner Cassette to cassette mask aligner can be used manually or in auto mode Mask aligner for 2"-5" wafers.
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Inquire
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CHA Industries Mark 50 Source Evaporator
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CHA Industries Mark 50 Source Evaporator, Chamber 32" diameter by 32" Long Process.
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Inquire
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Convergent 3000 Mask Coater with Bake
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Convergent 3000 mask coater with bake.
Resist coat tool for mask substrates for use in advanced mask writing application.
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Inquire
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showing 1 - 25 of 175
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