PhotoResist Stripper
Single Wafer
75-100 Millimeter
The GaSonics Aura 2000-LL Stripper is a single wafer loadlocked system, design to address the demands for ultra clean, damage free photoresist removal. This loadlock system utilizes proven components of the Aura 1000 system, including a highly reliable downstream microwave process.
Features
- 8” process capabilities
- Loadlock with cool-down station for processed wafer
- Water-cooled chamber and lamp assembly
- Manually adjustable power to lamps
- Gas box, designed to hold four MFC’s
- Downstream endpoint detection
- Rear access with control panel for servicing
Product Specifications
| Typical Process Parameters |
| Pressure |
1.25 to 3.5 torr |
| Gas Flow O2 |
3.0-4.5 SLPM |
| Gas Flow N2 |
0.30-.45 SLPM |
| Lamp Time (variable) |
15-30 sec. |
| Typical Process Results |
| Strip Rates |
1.0-3.0µ/min. for 8” wafer photoresist |
| |
1.6-4.0µ/min. for 6” wafer photoresist |
| |
1.6-4.0µ/min. for 5” wafer photoresist |
| Uniformity |
<±10% for all wafer sizes |
| Repeatability |
±10% (w-t-w) |
| Throughput |
>40 wph for 1.2µ PR |
| Particle Control |
< .1 p/cm2; 0.3µ in size |
| Damage Control |
<0.1volt CV-shift for 250Å oxide |
| Selectivities to underlying films |
>100:1 |
| Dimensions |
| Stripper |
L=60” W=39” H=72” |
| Pump Cart |
L=37” W = 31” H=37” |
| Utilities |
| Vacuume |
165 cfm |
| Exhasut |
>250 cfm |
| Process Gasses |
2(4) MFC’s |
| Electrical Equipment |
208V, 3 phase, 60 Hz 20A/phase |
| Weight |
250 lbs., 112 kilograms |
| Applications |
| Bulk resist removal 1.65 cfm |
| High-dose implanted resist >250 cfm |
| Descum |
| Non-oxidizing metal processing |
How may we help you? Contact us today to discuss your service needs or to request a price quote.
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