Automatic arrayed target measurement; CPM advanced overlay.
Bi-directional SECS/GEM Communication.
0.02 particles/cm2/pass
Unlimited sites
Low backside contamination including coating
< 5 nm accuracy
Throughput > 95 wph (5 sites/ wafer
< 4nm Repeatability
208/220 VAC, 15-20A, 50/60 Hz, single phase
408-654-9500
