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Configurable for 75mm, 100mm, 125mm, and 150mm Wafer Sizes
Cassette to Cassette wafer handling
Gasses: 1) NF3, 2) CF4, 3) HE, 4) O2, PURGE, N2 (VCR Fittings)
No RF damage (£0.1 VOLT CV SHIFT)
Front and backside etching
Variable platen temperature
Alumina (ceramic) Plasma Tube
Fluoirne compantible chamber
SECS II interface
Multiple step process capability
Stand alone / floor standing model
Footprint: 31"W x 37"D x 55"H
208VAC / 60Hz / 30A / 3 Phase (WYE)
Mfr: 1996 Cofiguration A99-004-03
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408-654-9500
