Capable of manual, semiautomatic or fully automatic - System Capable of 3" to 5" Wafer / Cassette to CassetteKarl Suss MA56 Mask Aligner Exposure SystemSystem Capable of 3" to 5" Wafer / Cassette to Cassette350 W Lamp housingUV-400 Exposure Optics365nm-405nm WavelengthMax Substrate Size 5" x 5"KSM-Split Field MicroscopeObjective Distance Adjustable 24-100mmMotorized XYZ Stage208v / 1phase / 20amp5 Bar (80psi CDA2 Bar (35psi) N20.7 Bar Minimum