Rapid Thermal Processor System Capability up to 6" Rapid Thermal Processor System Capability up to 6" Wafers System to Include a 6-Gas Panel Percise Temperature / Time Control and Multiple Cycle Processing Full SECS II Capability Steady State Temperature Range 400 to 1200c Steady State Process Time Programmable : 0-600 Sec Single Wafer Processing Capability up to 6".