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showing 1 - 25 of 86
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ADE 8100 Microscan
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WaferCheck 8100 system automatically measures and sorts 100 to 200mm wafers High speed belted sorter
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Inquire
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ADE EpiScan 1000
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High-speed film thickness measurement and mapping tool. Capable of 4" to 8" Wafers.
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Inquire
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ADE Ultra Gage 9500
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Multifunction Dimensional measurements for 500 nm Design Rule. Supports 4" to 8" wafer diameter.
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Inquire
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ADE Ultrascan 9300 Wafer Inspection / Sorter System
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Non-Contact Capacitive Probe Measurement with 10nm Resolution, 400 to 1000 Microns Wafer Thickness Range. Capable of handling 100mm to 200mm Wafers.
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Inquire
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ADE Ultrascan 9350 Wafer Inspection System
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Non-Contact Capacitive Probe Measurement with 10nm Resolution, 400 to 1000 Microns Wafer Thickness Range. Capable of handling 100mm to 200mm Wafers.
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Inquire
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APT Model:3455 Metal lift off system
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APT Model:3455 Metal lift off system/coater
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Inquire
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Bio-Rad PT7150 RF Barrel Etcher
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Automatic RF Plasma Barrel reactor with 10cm diameter chamber and 150W power
supply.
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Inquire
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Branson L400 Open Top Vapor Degreaser
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Branson L400 Open Top Vapor Degreaser
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Inquire
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Canon PLA 501F Parallel Light Mask Aligner
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Parallel Light Mask Aligner Cassette to cassette mask aligner can be used manually or in auto mode Mask aligner for 2"-5" wafers.
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Inquire
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Convergent 3000 Mask Coater with Bake
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Convergent 3000 mask coater with bake.
Resist coat tool for mask substrates for use in advanced mask writing application.
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Inquire
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Dektak IIA (Sloan)
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Surface Profile Measuring System, Capability up to 6".
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Inquire
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Estek Wis 600 Inspection System Wafer Surface Analysis System
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Wafer Surface Analysis System Light and dark channel, Capability 3" to 6" wafers.
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Inquire
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Gasonics L3500(2)
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Inquire
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GaSonics L3500(3)
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Inquire
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InspecTech KIS 2000 Dicing Yield Maximizer
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automatic system for inspecting diced semiconductor wafers up to 200 mm in diameter (with a 300 mm option).
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Inquire
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Intergrated Measurement Systems Inc. Three Scan Speeds
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Intergrated Measurement Systems Inc. Three Scan Speeds
Scan Length: 50 Microns to 30MM, Tracking Force: 10 to 50MG.
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Inquire
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KLA / Tencor P20H Long Scan Profiler
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Long Scan Profiler
Measurement of vertical features ranging from 100A to 0.3mm
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Inquire
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KLA 2131 Defect Inspection System
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High Speed Multilayer Wafer Inspection For Process Defects Inspection Modes for Arrayed and Random Patterns- 4" to 8" Water Capability
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Inquire
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KLA 2131 Defect Inspection System Upgraded to 2132
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High Speed Multilayer Wafer Inspection For Process Defects Inspection Modes for Arrayed and Random Patterns- 4" to 8" Water Capability
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Inquire
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KLA 2606 Defect Review Station
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Review Station with Nikon BD Plan 10/20/60/100 Objectives
4" to 6" Water Capability
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Inquire
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KLA 2606 Defect Review Station (2)
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Review Station with Nikon BD Plan 10/20/60/100 Objectives
4" to 6" Water Capability
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Inquire
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KLA Tencor 5200
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KLA-Tencor 5200 Overlay Inspection System , Automatic arrayed target measurement; CPM advanced overlay. Bi-directional SECS/GEM Communication. 0.02 particles/cm2/pass
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Inquire
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KLA Tencor 6100
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Non-Patterned Wafer Surface Inspection System.
Throughput 150 per hour of 200mm
Wafer Size 100,125,150,200 mm
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Inquire
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KLA Tencor 6200
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Capable of handling 4", 5", 6" and 8" wafer submicron sensitivity, detects 0.10 micron particles.
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Inquire
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KLA Tencor 7600M
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KLA / Tencor 7600 Surfscan Patterned / Unpatterned Wafer Inspection System Can detect defects as small as 0.15 m Can measure defects on unpatterned wafers and measuring wafers from 4" to 8"
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Inquire
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showing 1 - 25 of 86
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