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Category: RIE

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Image Product Details Inquiry
Yield YES R-3 Plasma Cleaning SystemChamber size: 16" W x 12" D x 7" H
Low cost, low volume system with sequencer control Parallel plate designCan be used in Active, Electron-free or RIE modeYield YES R-3 Plasma Cleaning SystemTotal plasma uniformity across planar shelves.Capacitive downstream reactor.Multi-program microprocessor controllerTwo gas inputs.Chamber size: 16" W x 12" D x 7" H
 
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