Surplus Process Equipment Corporation
Equipment for Sale:
Search by Manufacturer: >> GaSonics        >> KLA Tencor        >> Karl Suss        >> ADE
 
 
Search by Equipment Type:
New Arrivals
Asher Systems
Chillers
Cleaning Systems
Dicing Saws
Ellipsometers/Film Thickness Measurement
Etchers
Evaporators
Furnaces-Autoclaves
Gas Cabinets
HMDS Equipment
Inspection Systems
Ion Implantors
Ion Mills
Laser Marking Systems
LPECVD
Mask Aligner - Exposure Systems - UV
Mask Equipment
Metrology - Test & Inspection System
Microscopes-Comparators
Miscellaneous
Ovens
PECVD - Oxidation
Photoresist Coaters-Tracks
Plasma Ashers
Plasma Etchers
Power Supplies-RF-Plasma-E-Gun
Pumps-Vacuum
Reactors
RIE
Robots-Stages-Material Handling
RTA - RTP Rapid Thermal Annealing/Processor
SEM - Scanning Electron Microscopes
Spin Rinser Dryer
Sputtering Systems
Steppers
UV Systems
Vacuum Valves-Chambers-Systems
Vibration-Isolation Tables
Wet Process Systems-Stripper-Develop
X-Ray
Search by Part Type:    All Parts
GaSonics Parts
KLA-Tencor Parts
ADE Parts
Karl Suss Parts
Miscellaneous Parts
See our entire inventory
 
 

    showing 1 - 25 of 41   next 16
Image Product Details Inquiry
Dektak IIA (Sloan)
Surface Profile Measuring System, Capability up to 6".
 
Inquire
InspecTech KIS 2000 Dicing Yield Maximizer
automatic system for inspecting diced semiconductor wafers up to 200 mm in diameter (with a 300 mm option).
 
Inquire
KLA / Tencor P20H Long Scan Profiler
Long Scan Profiler
Measurement of vertical features ranging from 100A to 0.3mm
 
Inquire
KLA 2131 Defect Inspection System
High Speed Multilayer Wafer Inspection For Process Defects Inspection Modes for Arrayed and Random Patterns- 4" to 8" Water Capability
 
Inquire
KLA 2131 Defect Inspection System Upgraded to 2132
High Speed Multilayer Wafer Inspection For Process Defects Inspection Modes for Arrayed and Random Patterns- 4" to 8" Water Capability
 
Inquire
KLA 2606 Defect Review Station
Review Station with Nikon BD Plan 10/20/60/100 Objectives
4" to 6" Water Capability
 
Inquire
KLA 2606 Defect Review Station (2)
Review Station with Nikon BD Plan 10/20/60/100 Objectives
4" to 6" Water Capability
 
Inquire
KLA Tencor 5200

KLA-Tencor 5200 Overlay Inspection System , Automatic arrayed target measurement; CPM advanced overlay. Bi-directional SECS/GEM Communication. 0.02 particles/cm2/pass

 
Inquire
KLA Tencor 6100

Non-Patterned Wafer Surface Inspection System.
Throughput 150 per hour of 200mm
Wafer Size 100,125,150,200 mm

 
Inquire
KLA Tencor 6200
Capable of handling 4", 5", 6" and 8" wafer submicron sensitivity, detects 0.10 micron particles.
 
Inquire
KLA Tencor 7600M
KLA / Tencor 7600 Surfscan Patterned / Unpatterned Wafer Inspection System Can detect defects as small as 0.15 m Can measure defects on unpatterned wafers and measuring wafers from 4" to 8"
 
Inquire
KLA Tencor 7700(M) (2)

KLA / Tencor 7700 Surfscan Patterned / Unpatterned Wafer Inspection System, Can detect defects as small as 0.15 m, Can measure defects on unpatterned wafers and measuring wafers from 4" to 8"

 
Inquire
KLA Tencor AIT I (In-Line Defect Inspection System)

Automated full water inspection system for detecting particles as small as 0.10 micrometers on bare silicon and patterned process wafers. High throughput of up to 30 full wafer scans per hour on 150 mm wafers.

 
Inquire
KLA Tencor AIT I - Model:8020

KLA Tencor AIT 706copper , Model:8020 , Automated full wafer inspection system for detecting particles as small as 0.10 micrometers on bare silicon and patterned process wafers

 
Inquire
KLA Tencor P20H Long Scan Profiler
Long Scan Profiler
Measurement of vertical features ranging from 100A to 0.3mm
 
Inquire
KLA Tencor SurfScan 4500

KLA Tencor Surfscan 4500 Surface Particle Inspection Analyzer

Laser -based system that scans the entire substrate surface, producing

color coded graphic displays and hardcopy printouts of particles

locations.

Sub micron particles, down to 0.2um are readily detected.

Measurement time : 30 sec on 6" wafers

Particles Sensitivity : 0.2um diameter latex spheres.

 
Inquire
KLA Tencor Surfscan 7600(M)
Can measure defects on unpatterned wafers and measuring wafers from 4" to 8" KLA / Tencor 7600 Surfscan Patterned / Unpatterned Wafer Inspection System. W/Microscope
 
Inquire
KLA- Tencor P2 Long Scan Profilometer
High sensitivity surface profiler measuring roughness, waviness and step height. Sample Size: up to 200 mm
 
Inquire
KLA-Tencor 2020

KLA Tencor 2020 - Cassette to Cassette Wafer Handling.

Macro Inspection on Multi-Layer Wafers.

 
Inquire
KLA-Tencor 6200 Surfscan
Non-Patterned Wafer Surface Inspection System.
Throughput 150 per hour of 200mm
Wafer Size 100,125,150,200 mm

 
Inquire
KLA-Tencor 6200 Surfscan - Wafer Surface Contamination Analyzer
Capable of handling 4", 5", 6" and 8" wafer submicron sensitivity, detects 0.10 micron particles.
 
Inquire
KLA-Tencor 6200 Surfscan - Wafer Surface Contamination Analyzer
Capable of handling 4", 5", 6" and 8" wafer submicron sensitivity, detects 0.10 micron particles.
 
Inquire
KLA-Tencor 6220 Surfscan Wafer Surface Inspection System
Non-Patterned Wafer Surface Inspection System.
Throughput 150 per hour of 200mm
Wafer Size 100,125,150,200 mm (4" to 8" Water Capability)

 
Inquire
KLA-Tencor 6220 Surfscan Wafer Surface Inspection System
Non-Patterned Wafer Surface Inspection System.
Throughput 150 per hour of 200mm
Wafer Size 100,125,150,200 mm (4" to 8" Water Capability)

 
Inquire
KLA-Tencor 6420 Surfscan Unpatterned Surface Inspection System
Non-patterned wafer film surface analyzer
Wafer Size 100,125,150,200 mm  round or rectangular substrates
 
Inquire
    showing 1 - 25 of 41   next 16